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Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields. Получить ссылку |
Materials Characterization. Introduction to Microscopic and Spectroscopic Methods
Автор: Yang Leng
Год издания:
Now in its second edition, this continues to serve as an ideal textbook for introductory courses on materials characterization, based on the author's experience in teaching advanced undergraduate and postgraduate university students. The new edition retains the successful didactical concept of introductions at the beginning of chapters, exercise questions and an online solution manual. In addition, all the sections have been thoroughly revised, updated and expanded, with two major new topics (electron backscattering diffraction and environmental scanning electron microscopy), as well as fifty additional questions – in total about 20% new content. The first part covers commonly used methods for microstructure analysis, including light microscopy, X-ray diffraction, transmission and scanning electron microscopy, as well as scanning probe microscopy. The second part of the book is concerned with techniques for chemical analysis and introduces X-ray energy dispersive spectroscopy, fluorescence X-ray spectroscopy and such popular surface analysis techniques as photoelectron and secondary ion mass spectroscopy. This section concludes with the two most important vibrational spectroscopies (infra-red and Raman) and the increasingly important thermal analysis. The theoretical concepts are discussed with a minimal involvement of mathematics and physics, and the technical aspects are presented with the actual measurement practice in mind. Making for an easy-to-read text, the book never loses sight of its intended audience.
Diffraction and Spectroscopic Methods in Electrochemistry
Автор: Группа авторов
Год издания:
This ninth volume in the series concentrates on in situ spectroscopic methods and combines a balanced mixture of theory and applications, making it highly readable for chemists and physicists, as well as for materials scientists and engineers. As with the previous volumes, all the chapters continue the high standards of this series, containing numerous references to further reading and the original literature, for easy access to this new field. The editors have succeeded in selecting highly topical areas of research and in presenting authors who are leaders in their fields, covering such diverse topics as diffraction studies of the electrode-solution interface, thin organic films at electrode surfaces, linear and non-linear spectroscopy as well as sum frequency generation studies of the electrified solid-solution interface, plus quantitative SNIFTIRS and PM-IRRAS. Special attention is paid to recent advances and developments, which are critically and thoroughly discussed. The result is a compelling set of reviews, serving equally well as an excellent and up-to-date source of information for experienced researchers in the field, as well as as an introduction for newcomers.
Infrared and Raman Spectroscopic Imaging
Автор: Группа авторов
Год издания:
This second edition of the successful ready reference is updated and revised with approximately 30% new content to reflect the numerous instrumental developments and improvements, as well as the significant expansion of this rapidly developing field. For example, the combination of IR imaging with AFM has enhanced the achievable lateral resolution by an order of magnitude down to a few hundred nanometers, thus launching a multiplicity of new applications in material science. Furthermore, Raman and IR spectroscopic imaging have become key technologies for the life sciences and today contribute tremendously to a better and more detailed understanding of numerous biological and medical research topics. The topical structure of this new edition is now subdivided into four parts. The first treats the fundamentals of the instrumentation for infrared and Raman imaging and mapping and an overview on the chemometric tools for image analysis. The second part describes a wide varie-ty of applications ranging from biomedical via food, agriculture and plants to polymers and pharmaceuticals. This is followed by a description of imaging techniques operating beyond the diffraction limit, while the final part covers special methodical developments and their utility in specific fields. With its many valuable practical tips, this is a must-have overview for researchers in academic and industrial laboratories wishing to obtain reliable results with this method.
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