Скачать книгу - Characterization of Powders and Aerosols

This book provides a comprehensive review of the state-of-the-art in the development of new and innovative materials, and of advanced modeling and characterization methods for nanoscale CMOS devices. Leading global industry bodies including the International Technology Roadmap for Semiconductors (ITRS) have created a forecast of performance improvements that will be delivered in the foreseeable future – in the form of a roadmap that will lead to a substantial enlargement in the number of materials, technologies and device architectures used in CMOS devices. This book addresses the field of materials development, which has been the subject of a major research drive aimed at finding new ways to enhance the performance of semiconductor technologies. It covers three areas that will each have a dramatic impact on the development of future CMOS devices: global and local strained and alternative materials for high speed channels on bulk substrate and insulator; very low access resistance; and various high dielectric constant gate stacks for power scaling. The book also provides information on the most appropriate modeling and simulation methods for electrical properties of advanced MOSFETs, including ballistic transport, gate leakage, atomistic simulation, and compact models for single and multi-gate devices, nanowire and carbon-based FETs. Finally, the book presents an in-depth investigation of the main nanocharacterization techniques that can be used for an accurate determination of transport parameters, interface defects, channel strain as well as RF properties, including capacitance-conductance, improved split C-V, magnetoresistance, charge pumping, low frequency noise, and Raman spectroscopy.

A fundamental resource for understanding and developing effective self-assembly and nanotechnology systems Systematically integrating self-assembly, nanoassembly, and nanofabrication into one easy-to-use source, Self-Assembly and Nanotechnology Systems effectively helps students, professors, and researchers comprehend and develop applicable techniques for use in the field. Through case studies, countless examples, clear questions, and general applications, this book provides experiment-oriented techniques for designing, applying, and characterizing self-assembly and nanotechnology systems. Self-Assembly and Nanotechnology Systems includes: Techniques for identifying assembly building units Practical assembly methods to focus on when developing nanomaterials, nanostructures, nanoproperties, nanofabricated systems, and nanomechanics Algorithmic diagrams in each chapter for a general overview Schematics designed to link assembly principles with actual systems Hands-on lab activities This informative reference also analyzes the diverse origins and structures of assembly building units, segmental analysis, and selection of assembly principles, methods, characterization techniques, and predictive models. Complementing the author's previous conceptually based book on this topic, Self-Assembly and Nanotechnology Systems is a practical guide that grants practitioners not only the skills to properly analyze assembly building units but also how to work with applications to exercise and develop their knowledge of this rapidly advancing scientific field.

Now in its second edition, this continues to serve as an ideal textbook for introductory courses on materials characterization, based on the author's experience in teaching advanced undergraduate and postgraduate university students. The new edition retains the successful didactical concept of introductions at the beginning of chapters, exercise questions and an online solution manual. In addition, all the sections have been thoroughly revised, updated and expanded, with two major new topics (electron backscattering diffraction and environmental scanning electron microscopy), as well as fifty additional questions – in total about 20% new content. The first part covers commonly used methods for microstructure analysis, including light microscopy, X-ray diffraction, transmission and scanning electron microscopy, as well as scanning probe microscopy. The second part of the book is concerned with techniques for chemical analysis and introduces X-ray energy dispersive spectroscopy, fluorescence X-ray spectroscopy and such popular surface analysis techniques as photoelectron and secondary ion mass spectroscopy. This section concludes with the two most important vibrational spectroscopies (infra-red and Raman) and the increasingly important thermal analysis. The theoretical concepts are discussed with a minimal involvement of mathematics and physics, and the technical aspects are presented with the actual measurement practice in mind. Making for an easy-to-read text, the book never loses sight of its intended audience.

By means of electrochemical treatment, crystalline silicon can be permeated with tiny, nanostructured pores that entirely change the characteristics and properties of the material. One prominent example of this can be seen in the interaction of porous silicon with living cells, which can be totally unwilling to settle on smooth silicon surfaces but readily adhere to porous silicon, giving rise to great hopes for such future applications as programmable drug delivery or advanced, braincontrolled prosthetics. Porous silicon research is active in the fields of sensors, tissue engineering, medical therapeutics and diagnostics, photovoltaics, rechargeable batteries, energetic materials, photonics, and MEMS (Micro Electro Mechanical Systems). Written by an outstanding, well-recognized expert in the field, this book provides detailed, step-by-step instructions to prepare and characterize the major types of porous silicon. It is intended for those new to the fi eld. Sampling of topics covered: * Principles of Etching Porous Silicon * Etch Cell Construction and Considerations * Photonic Crystals, Microcavities, and Bragg Stacks Etched in Silicon * Preparation of Free-standing Films and Particles of Porous Silicon * Preparation of Photoluminescent Nanoparticles from Porous Silicon * Preparation of Silicon Nanowires by Electrochemical Etch of Silicon * Surface Modifi cation Chemistry and Biochemistry * Measurement of Optical Properties * Measurement of Pore Size, Porosity, Thickness, Surface Area The whole is backed by a generous use of color photographs to illustrate the described procedures in detail, plus a bibliography of further literature pertinent to a wide range of application fi elds. For materials scientists, chemists, physicists, optical physicists, biomaterials scientists, neurobiologists, bioengineers, and graduate students in those fields, as well as those working in the semiconductor industry.