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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. |
El f?tbol de toda mi vida. ?El beso a?reo! La boda of the football player
Автор: Natalie Ponomareva
Год издания:
The Ideal Team Player. How to Recognize and Cultivate The Three Essential Virtues
Автор: Патрик Ленсиони
Год издания: